THE WORLD'S LARGEST SPIN COATER
Coater for large substrates.
GPTG project, advanced package and many applications like AI and other microchips.
The world's largest spincoater with C3 technology is now available for demonstration at ON Nano in our demo laboratory.
Coating setups for thicknesses from 5 nm up to 1 mm, with many features for perfect coating, are available. A hotplate for large sizes and other processes relevant equipment is also available in the laboratory.
The system is ready to handle all size and processes for the GPS Glass Panel Substrates.
It features functions from the fully automated equipment but manually loaded.
SEMIAUTOMATED SYSTEM
In our semi-automated production environment, all equipment is manually loaded while the coating and development processes remain fully automated. This hybrid approach ensures operational flexibility without compromising precision or throughput.
Our range includes spin coaters, spray coaters,
developers, hotplates, and HMDS systems —
all engineered for reliability and performance. All equipment is available either for bench-top mounting or as a stand-alone configuration —tailored to meet your space and workflow needs.
TEMPORARY BONDING & DEBONDING
The ideal product for small-scale production is compatible for all shaped wafers, ensuring optimal results.
Bonding and Debonding up to 200mm
Bonding and Debonding up to 300mm
At ON NANO, a diverse range of bonding materials is available, encompassing both water-based and solvent-based options.
nanoBOND 20
nanoDEBOND 20
COATING, DEVELOPING & HEATING FOR LARGE SUBSTRATES
GCS glass core substrate and other glass substrate
GCS Coater and Developer
Chuck System (C3)
Our new and innovative, patented Covered Chuck System C3 is designed to coat glass substrates of any size with exceptional precision. It is compatible with all types of GCS glass and any resist material and ensures minimal edge beat formation.
Superior Protection and Static Reduction
The new C3 system effectively reduces static loading on both sensitive and non-sensitive materials, while also protecting the backside of the substrate from contamination.
High-Quality C3 Coating, Every Time
Paired with our C3 coater, this system guarantees a superior coating process for both thin and thick substrates — C3 coating avoids the thermal effect.
CLEANING & ETCHING
Single Substrate cleaning and etching system
Fully automated system for any industry
Developer, Cleaner, Etcher up to 300mm and 9x9“ Mask.
Advanced processes for Cleaning or Etching with our new with Gas Phase process, reduces chemicals usage more than 90%.
High-Quality cleaning and Etching processes in a multi chamber system
OUR FULLY AUTOMATED COATER & DEVELOPER
The new ON Nano Matrix Coater, Developer and Hot Module provide optimal process performance with gentle substrate handling and new patents for glass and transparent wafers.
All process modules are arranged in horizontal rows and vertical columns.
This setup allows for concise and fast substrate processing and transfer.
The ON Matrix system is used in various semiconductor fields. High volume production, front end and back end processing, sensor production, scientific R&D, OLED and micro OLED manufacturing and defense and security manufacturing.
The ON Matrix unit with fully loaded modules has the smallest footprint and is the most compact unit on the market.
300 MM COATER DEVELOPER FOR HIGH THROUGHPUT WITH MANY FEATURES
Up to 10 coater or developer spin module
Up to 30 hots-tacks for HMDS, hotplate,
Low O2 plate, Coolplate,
In situ coating thickness measurement
Cleanroom environment with temperature and humidity-controlled atmosphere
SECS/GEM compatible